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チェン先生の論文がJMEMSに掲載されました。 2017-11-04

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中国科学技術院・上海技術物理研究所から研究室に2年間滞在した程正喜(Zhengxi CHENG)先生の論文がJMEMSに掲載されました。設計ルール0.35μmの標準的なCMOSプロセスラインを用いて静電駆動型のディジタルマイクロミラーを製作する手法とその評価結果を報告しています。

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Dr. Zhengxi CHENG, an ex-visitor to the lab from Shanghai Institute of Technical Physics, Chinese Academy of Sciences, publishes his work in IEEE/ASME J.MEMS. In this paper, he reports a method to develop electrostatic micro mirror device by using the standard 0.35-µm CMOS process line and the results of electromechanical characterization.

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http://ieeexplore.ieee.org/document/8094355/

Article information:
This paper appears in: IEEE/ASME Journal of Microelectromechanical Systems
Volume: <not found> Issue: <not found>
Print ISSN: 1057-7157
Online ISSN: 1941-0158
Digital Object Identifier: 10.1109/JMEMS.2017.2764094

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Last-modified: Thu, 28 Dec 2017 13:37:56 JST (22d)